![]() ![]() ![]() An excellent quality epitaxial film was deposited on a silicon wafer. Slim rods were grown from seed silicon rods for subsequent float zone operation and impurity characterization. Also, the quality control method development task was completed. The free-space reactor development work was completed with a final 12-hour run in which the free-space reactor PDU ran flawlessly. Various computer programs are being written which will be used to convert electrical, pneumatic and other raw signals into engineering values. The data collection system design is progressing. ![]() The switch gear/control building and the melter building will be completed during the next quarter. Equipment and building foundations have been completed at the EPSDU site, and all the steel was erected for the gantry. Most of the process related equipment has been ordered and is being fabricated. Progress is reported on the engineering design, fabrication, assembly, operation, economic analysis, and process support R and D for an Experimental Process System Development Unit (EPSDU) for producing semiconductor-grade silicon using the silane-to-silicon process. ![]()
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